Tantalum thin films EUVR data

S-polarized Angle-Dependent Reflectance (ADR) data measured from two Tantalum thin films deposited on Silicon substrates using monochromatized synchrotron radiation. The data was collected at the soft X-ray radiometry beamline (SX700) in the radiometry laboratory of the Physikalisch-Technische Bundesanstalt (PTB), in the electron storage facility BESSY II of Helmholtz Centre for Materials and Energy (HZB). The nominal thicknesses for the two thin films were 30.0 nm and 50.0 nm, hence, the .txt data files of the thin films samples are referred to as Sample-30 and Sample-50. The ADR data was collected in the Extreme Ultraviolet (EUV) range. For Sample-30 and Sample-50 the ADR was measured in the spectral ranges 5.0 nm – 24.0 nm and 10.0 nm – 20.0 nm, respectively. The EUVR of Sample-30 correspond to the angular range 3.0° – 85.5°. The EUVR of Sample-50 correspond to the angular range 4.5° – 87.0°. The .txt files contain post-processed reflectance values each with its calculated absolute uncertainty.本数据集为S偏振角相关反射率（S-polarized Angle-Dependent Reflectance, ADR）数据，采自沉积于硅衬底上的两种钽薄膜样品，测试采用单色化同步辐射光源完成。测量工作在亥姆霍兹材料与能源中心（Helmholtz Centre for Materials and Energy, HZB）BESSY II电子存储环装置内的德国联邦物理技术研究院（Physikalisch-Technische Bundesanstalt, PTB）辐射计量实验室的软X射线辐射计量光束线（SX700）上开展。两种薄膜的标称厚度分别为30.0 nm与50.0 nm，因此对应的.txt数据文件分别命名为Sample-30与Sample-50。本次ADR数据采集覆盖极紫外（Extreme Ultraviolet, EUV）波段，其中Sample-30的测量光谱范围为5.0 nm – 24.0 nm，Sample-50为10.0 nm – 20.0 nm。Sample-30的极紫外反射率（Extreme Ultraviolet Reflectance, EUVR）测量角度范围为3.0° – 85.5°，Sample-50的EUVR测量角度范围为4.5° – 87.0°。所有.txt格式数据文件均包含经过后处理的反射率数值，每条数值均附带其计算得到的绝对不确定度。