Selective-Area Epitaxy of Bulk-Insulating (BixSb1-x)2Te3 Films and Nanowires by Molecular Beam Epitaxy

This folder contains the data files used in the generation of the main and supplementary figures of our publication in ACS Applied Materials & Interfaces, titled: "Selective-Area Epitaxy of Bulk-Insulating (BixSb1-x)2Te3 Films and Nanowires by Molecular Beam Epitaxy", written by G. Lippertz, O. Breunig, R. Fister, A. Uday, A. Bliesener, J. Brede, A. Taskin, and Y. Ando.

The measurement data for each figure can be found in csv format in the corresponding folder. The labels and units are specified in the file headers. The main and supplementary figures of the manuscript are added as well in pdf format.

本文件夹存储了用于生成我们发表于《ACS应用材料与界面》（ACS Applied Materials & Interfaces）的论文的主图与补充图的数据文件。该论文标题为《采用分子束外延（Molecular Beam Epitaxy）制备体绝缘(BixSb1-x)₂Te₃薄膜与纳米线的选区外延》，作者为G. Lippertz、O. Breunig、R. Fister、A. Uday、A. Bliesener、J. Brede、A. Taskin与Y. Ando。
各图对应的测量数据以CSV格式存储于对应子文件夹内，文件表头中已注明数据标签与单位。本文稿的主图与补充图亦以PDF格式一并提供。