Ar+ and N+ ion irradiated Co/Pt and Pt/Co bilayered stacks

This dataset comprises X-ray diffraction (XRD), secondary ion mass spectrometry (SIMS), and vibrating sample magnetometry (VSM) data obtained from the study of thin-film structures. The films are composed of cobalt (Co) and platinum (Pt) layers with configurations Co(10 nm)/Pt(10 nm)/substrate and Pt(10 nm)/Co(10 nm)/substrate. Both types of films were fabricated by magnetron sputtering deposition at room temperature onto Si(001)/SiO2 substrates.

The as-deposited samples were subjected to N+ and Ar+ ion irradiation using a BALZERS MPB 202 ion implanter system with the ion energy of 110 keV and ion dose 1 × 1015 ions/cm2. The irradiated stacks were post-annealed in vacuum of 10−6 mbar at 550°С for 30 min and investigated along with non-irradiated samples after same single-stage thermal treatment.  

The XRD data, obtained using a Rigaku Ultima IV diffractometer (CuKα radiation), provides information on the crystal structure of the films. SIMS data, acquired with an Ion ToF IV device, reveals depth profiles and elemental composition, while the magnetic properties of the films were characterized using a vibrating sample magnetometer (VSM).

本数据集包含针对薄膜结构开展研究获得的X射线衍射（X-ray diffraction, XRD）、二次离子质谱（secondary ion mass spectrometry, SIMS）以及振动样品磁强计（vibrating sample magnetometry, VSM）测试数据。所研究的薄膜由钴（Co）与铂（Pt）层构成，共有两种层叠构型：Co(10 nm)/Pt(10 nm)/衬底，以及Pt(10 nm)/Co(10 nm)/衬底。两类薄膜均采用磁控溅射沉积法，于室温下沉积在Si(001)/SiO₂衬底之上。

沉积态样品使用BALZERS MPB 202型离子注入机系统，以110 keV的离子能量、1×10¹⁵ ions/cm²的离子剂量，分别接受N⁺与Ar⁺离子辐照。辐照后的薄膜叠层随后在10⁻⁶ mbar的真空环境中于550℃后退火30分钟；未经过辐照的样品也接受了相同的单阶段热处理，两类样品均被纳入测试分析范围。

本数据集采用Rigaku Ultima IV型衍射仪（搭载CuKα辐射）采集XRD数据，可反映薄膜的晶体结构；使用Ion ToF IV型设备获取SIMS数据，能够表征薄膜的深度分布与元素组成；而薄膜的磁学性能则通过振动样品磁强计完成表征。