NIST Nanocalorimeter DWG and DXF drawings for microfabrication mask generation

Four files are included in this data set for mask generation that can be used to produce photolithography contact masks to create NIST nanocalorimeters. Two different designs are included, each in AutoCAD *.dwg format and a universal *.dxf format. The masks are intended to be printed on 5 inch masks blanks used to pattern 100 mm (4 inch) wafers. The front drawings are used to pattern the metal layer that defines the contact pads and the combined heater / thermometer and includes alignment marks at the center of the mask and at approximately plus and minus 1 inch along the X-axis for front to back alignment. The rear drawings have already been mirrored and define the KOH etch windows used to create individual die and create the windows in the center of the nanocalorimeter. The dimensions of the windows was defined for a standard, nominal, 525 micron thick 100-mm wafer.Please cite the related paper "Guide to the Design, Fabrication and Calibration of NIST Nanocalorimeters" by Feng Yi, Michael D. Grapes, and David A. LaVan in the Journal of Research of the National Institute of Standards and Technology, Volume 124 (in press).

本数据集包含4个用于掩模生成的文件，可用于制作光刻接触掩模（photolithography contact masks）以制备NIST纳米量热仪（nanocalorimeters）。数据集包含两种不同设计，每种设计均提供AutoCAD *.dwg格式和通用*.dxf格式文件。这些掩模拟用于打印在5英寸掩模坯（mask blanks）上，以对100毫米（4英寸）晶圆（wafers）进行图案化。正面图纸用于图案化金属层，该层定义了接触垫（contact pads）及集成式加热器/温度计，并包含位于掩模中心以及沿X轴约±1英寸处的对准标记（alignment marks），用于正反面对准。背面图纸已镜像处理，定义了KOH蚀刻窗口（etch windows），用于制作单个芯片（die）及在纳米量热仪中心形成窗口。窗口尺寸针对标准标称厚度为525微米的100毫米晶圆设计。请引用相关论文：Feng Yi、Michael D. Grapes与David A. LaVan发表于《美国国家标准与技术研究院研究期刊》（Journal of Research of the National Institute of Standards and Technology）第124卷（待刊）的《NIST纳米量热仪的设计、制备与校准指南》（Guide to the Design, Fabrication and Calibration of NIST Nanocalorimeters）。