"Validation Data for the Correlation Between the Effective Near-Field Coupling Mutual Inductance and the Average Insertion Loss"
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https://ieee-dataport.org/documents/validation-data-correlation-between-effective-near-field-coupling-mutual-inductance-and
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"This figure highlights a key finding of the paper: the proposed effective mutual inductance metric meff can effectively characterize the high-frequency differential-mode performance of a three-phase four-wire \u03c0-type EMI filter and shows a strong correlation with the average insertion loss (IL). By comparing multiple sets of mutual-inductance samples, it can be observed that changes in meff are accompanied by clear variations in the average IL. This result indicates that meff can serve as an effective indicator for evaluating the impact of near-field coupling and for guiding PCB layout optimization, providing data support for the design and performance prediction of high-density EMI filters."
提供机构：
IEEE DataPort
创建时间：
2026-03-18
