纳米精度在位测量系统测头误差校正方法研究

提出了一种测头半径误差及形状误差校正方法。比较分析了测头误差未校正、测头半径误差校正及测头形状误差校正三种情况的测量结果，并分别与 TaylorhobsonPGI1840离线测量结果进行对比，以验证测头形状误差校正方法的有效性。测 头 形 状 误 差 校 正 后，面形精度 ＰＶ 值由 ４２０ｎｍ 变为３７０ｎｍ，与离线测量 ＰＶ 值３８０ｎｍ 的差值为１０ｎｍ。数据量为356KB。

A method for correcting both probe radius error and shape error is proposed. Measurement results under three scenarios, i.e., uncorrected probe error, probe radius error corrected, and probe shape error corrected, were comparatively analyzed, and were respectively compared with the offline measurement results from Taylorhobson PGI1840 to verify the effectiveness of the proposed probe shape error correction method. After the probe shape error correction, the peak-to-valley (PV) value of surface shape accuracy decreased from 420 nm to 370 nm, with a difference of 10 nm compared to the offline measured PV value of 380 nm. The total data volume of this dataset is 356 KB.