Light intensity reflected from PAAO containing samples (AoI 45 deg., 60 deg., two polarisations)

The file contains raw intensity data measured in reflection mode for various material combinations: porous anodized aluminium oxide (PAAO), gold nanoparticles (Au NPs), diamond-like carbon with silver nanoparticles composite (DLC:Ag), quartz, and silicon.

List of investigated samples:

Sample name
Sample description

AJ1
Aluminium substrate, ~241 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 3 min 16 s), 60 nm diameter Au NPs (dip-coated at a speed of 1 μm/s)

AJ2
Aluminium substrate, ~259 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 3 min 37 s), 60 nm diameter Au NPs (dip-coated at a speed of 1 μm/s)

AJ3
Aluminium substrate, ~293 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 4 min 8 s), 60 nm diameter Au NPs (dip-coated at a speed of 1 μm/s)

AJ4
Aluminium substrate, ~317 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 4 min 30 s), 60 nm diameter Au NPs (dip-coated at a speed of 1 μm/s)

AJ5
Aluminium substrate, ~345 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 4 min 57 s), 60 nm diameter Au NPs (dip-coated at a speed of 1 μm/s)

AJ6
Aluminium substrate, ~276 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 3 min 42 s), ~55 nm thickness, 20 V.% Ag concentration DLC:Ag (magnetron sputtered using silver target, 80 sccm argon gas flow, 5.4 sccm C2H2 gas flow, 405 V voltage, 0.09-0.10 A current, 7·10-3 mbar work pressure, 2 minutes 32 seconds process duration)

AJ7
Aluminium substrate, ~316 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 4 min 25 s), ~55 nm thickness, 20 V.% Ag concentration DLC:Ag (magnetron sputtered using silver target, 80 sccm argon gas flow, 5.4 sccm C2H2 gas flow, 405 V voltage, 0.09-0.10 A current, 7·10-3 mbar work pressure, 2 minutes 32 seconds process duration)

AJ8
Aluminium substrate, ~345 nm thickness PAAO (anodized in 0.3 mol/L oxalic acid at 40 V for 5 min 4 s), ~55 nm thickness, 20 V.% Ag concentration DLC:Ag (magnetron sputtered using silver target, 80 sccm argon gas flow, 5.4 sccm C2H2 gas flow, 405 V voltage, 0.09-0.10 A current, 7·10-3 mbar work pressure, 2 minutes 32 seconds process duration)

Q140
Quartz substrate, ~55 nm thickness, 20 V.% Ag concentration DLC:Ag (magnetron sputtered using silver target, 80 sccm argon gas flow, 5.4 sccm C2H2 gas flow, 405 V voltage, 0.09-0.10 A current, 7·10-3 mbar work pressure, 2 minutes 32 seconds process duration)

Si140
Silicon substrate, ~55 nm thickness, 20 V.% Ag concentration DLC:Ag (magnetron sputtered using silver target, 80 sccm argon gas flow, 5.4 sccm C2H2 gas flow, 405 V voltage, 0.09-0.10 A current, 7·10-3 mbar work pressure, 2 minutes 32 seconds process duration)

The file also contains data for lamp and dark spectra. Images are for illustrative purposes and contain measured sample intensity minus dark intensity.

The spectra were collected by a custom-made computer-controlled motorized goniometer set-up with an incandescent lamp light source and an AvaSpec-2048 (Avantes) spectrometer covering a wavelength range of 360–860 nm with 1.2 nm resolution.

Notations inside the file: AoI - angle of incidence (45 deg. or 60 deg.), AoD - angle of detection (90 deg. is mirror reflection from 45 deg. incidence, while 120 deg. is the same for 60 deg.), pol - angle of the polarizing prism (0 deg. or 90 deg., light intensity was lower for the 0 deg.).