The AFM micrographs of isotropic etching silicon substrates (111)
收藏Most Wiedzy Open Research Data Catalog2026-04-17 收录
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资源简介：
The DataSet contains the atomic force microscope images of isotropic etching silicon substrates (111). The silicon wafers were etched in a mixture of nitric acid, hydrofluoric acid, and acetic acid in the ratio of 40:1:15. The soaking time for the substrates was from 20 to 90 seconds
A Nanosurf Easyscan 2 AFM atomic force microscopy was used to examine the morphology of thin films.
提供机构：
Jakub Karczewski; Marta Prześniak-Welenc
