Comparison of methods for the quantification of VUV emission among various low pressure plasmas.
收藏DataCite Commons2021-07-05 更新2025-04-16 收录
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https://www.orkg.org/orkg/comparison/R109041
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资源简介：
Low pressure plasmas, and in particular with low temperature, are intensively used in industrial applications. The presence of Vacuum Ultraviolet (high energy) photons is pervasive in these plasmas. The quantification of these photons is very relevant for the present and future applications. Comparison among various plasma discharges is endemically difficult due to the proliferation of methods in producing these plasmas.
提供机构：
Open Research Knowledge Graph
创建时间：
2021-05-24
