Self-Aligned Patterning of Tantalum Oxide on Cu/SiO2 through Redox-coupled Inherently Selective Atomic Layer Deposition
收藏DataCite Commons2023-07-27 更新2024-08-18 收录
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https://springernature.figshare.com/articles/dataset/Self-Aligned_Patterning_of_Tantalum_Oxide_on_Cu_SiO2_through_Redox-coupled_Inherently_Selective_Atomic_Layer_Deposition/22815749
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Source data for Self-Aligned Patterning of Tantalum Oxide on Cu/SiO2 through Redox-coupled Inherently Selective Atomic Layer Deposition
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figshare
创建时间:
2023-05-14



