Measurement data and simulations for reflectometry and scatterometry for a nanostructure

Measurement data and Simulations for Reflectometry and Scatterometry We provide measurement data and simulated data for a reflectometry measurement and a scatterometry measurement that was made on a silicone line-grating with a thin oxide-layer in order to investigate the dependence on prior knowledge. Both measurements were made at the PTB beamline in Bessy II. Reflectometry The reflectometry measurement was made on the unstructured part of the sample. Hereby the layer system was illuminated with a light beam for different wavelengths and incidence angles. Measurement setup: Wavelengths: 156 wavelengths ranging from 10.0 nm to 20.0 nm Incidence angles: αi ∈ [30, 86] deg Based on the reflectometry data a reconstruction was made, determining several parameters, to describe the layer system. Here the sample is modelled as a Si-bulk with a thin SiO2-layer on top and with a roughness-layer between materials. The assumed prior distributions of the parameters are uniform on the given domains. Parameter & prior domains: Layer thickness for the SiO2 layer in [5.5, 7.25] Roughness between the SiO2-layer and the environment in [0.9, 1.1] Roughness between the SiO2-layer and the Si-bulk in [0.9, 1.1] Optical constants n & k of SiO2 for each considered wavelength Hyperparameter describing a model error: a in [10-6, 10-1] b in [10-8, 5.1 · 10-2] For the optical constants the prior is visualised by the images: prior_bounds_n.pdf, prior_bounds_k.pdf. The reconstructed parameters are described as probability distributions, which are given by MCMC samples. For each parameter the mean and variance is contained in the data. Data for reflectometry measurement All data are given as .csv files. HZB_P100_CD45_combine_AOI_30-90_inner_wavelength_10.0-20.0nm.dat: measured reflectometry data (with relative and absolute measurement errors) for each considered wavelength in nm and incidence angles in deg means.csv: mean values for the resulting parameter distributions sdev.csv: standard deviation for the resulting parameter distributions Scatterometry During the scatterometry measurement the line grating area on the sample was illuminated for different wavelengths and a fixed incidence angle. The measured intensities contain three diffraction orders for each of the wavelengths. Measurement setup: Wavelengths: 50 wavelengths equally spaced from 10.0 nm to 13.0 nm Incidence angles: αi = 10° Diffraction orders: -1, 0, +1 s-polarization Azimuth angle φ ≈ 0° Forward simulation For the forward simulation the line grating is modelled as a silicone grating with a thin oxide layer on top of the grating. This model is defined by several geometric parameters, model parameters and the material parameter. The parameters for the pitch and the corner roundings are fixed to the following values: Pitch: 160 nm Corner rounding top: 5 nm Corner rounding bottom: 22 nm The variable parameters contain four geometric parameters h, w, swa, th_sio2, two model parameters sigma_roughness, phi_az, and one material parameter given by the material density of SiO2. The optical constants of SiO2 are changed through the material density using the information from the OCDB database from PTB. Parameter & domains: Height: h ∈ [95, 110] nm Width: w ∈ [33, 48] nm Side-wall angle: swa ∈ [-6, 4] Thickness of oxide layer: thick_sio2 ∈ [1, 7] Density for SiO2: rho_sio2 ∈ [0.5, 4.0] g/cm3 Roughness parameter: sigma_roughness ∈ [0, 2] Azimuth angle: phi_az ∈ [-0.1, 0.1] deg For the forward calculations we used a finite element solver from JCMsuite which maps one parameter set onto simulated diffraction intensities. For 2 · 104 uniform parameter samples from the given domains we have calculated the forward simulations. Both, the samples and the forward evaluations are contained in the data. Please note, that the data does not contain any modelling error and measurement noise as it is the case for real measurements. Data for scatterometry All data are given as .npy files. parameter_samples_uniform: uniform samples of the parameter domains intensities_forward_simulation: forward evaluation from the samples parameter_domains: boundaries of parameter domains parameter_names: sequence of parameter names measurement_scatterometry: measurement data for all wavelengths and diffraction orders exp_uc: relative uncertainties of the measurement Acknowledgement This project (21IND04 ATMOC) has received funding from the EMPIR programme co-financed by the Participating States and from the European Union's Horizon 2020 research and innovation programme.