Advanced nanoporous SiO2 coatings for ultraviolet laser-resistant high-reflection and anti-reflection optics

Laser-resistant coatings are becoming increasingly essential to meet the growing demand for high-power lasers. Enhancing the laser resistance of coating materials represents an effective strategy. By constructing both high-refractive-index (n) and low-n layers of dielectric coatings from SiO2 materials with a large band gap and low absorption loss—specifically, dense SiO2 and porous SiO2 layers—the laser-induced damage threshold (LIDT) of the coatings can be significantly improved. In this study, we demonstrate the fabrication of all-silica laser-resistant anti-reflection (AR) and high-reflection (HR) coatings using a combination of plasma ion-assisted electron-beam co-evaporation of an Al2O3-SiO2 mixture and a subsequent selective chemical etching process. Experiments proved the suitability of this method for producing large-scale multilayer coatings. The porous SiO2 layer exhibited absorption comparable to that of the fused silica substrate. Both AR and HR coatings showed outstanding laser resistance at 355 nm. Notably, the LIDT of the AR coating (~46.9 J/cm2) surpassed that of the fused silica substrate (~41.1 J/cm2). The proposed method is simple and cost-effective, holding great promise for advancing the development of high-performance laser coating.

为满足高功率激光器日益增长的应用需求，抗激光涂层的重要性与日俱增。提升涂层材料的抗激光性能是一条行之有效的技术路径。通过采用带隙大、吸收损耗低的二氧化硅（SiO₂）材料制备介质涂层的高折射率（n）与低折射率层——具体为致密二氧化硅与多孔二氧化硅层——可显著提升涂层的激光诱导损伤阈值（LIDT）。本研究采用等离子体离子辅助电子束共蒸发氧化铝-二氧化硅（Al₂O₃-SiO₂）混合物，并结合后续选择性化学蚀刻工艺，制备出全硅基抗激光增透（AR）与高反射（HR）涂层。实验证实，该方法适用于制备大规模多层涂层。多孔二氧化硅层的吸收性能与熔融石英基板相当。所制备的增透与高反射涂层在355 nm波长下均展现出优异的抗激光性能。值得注意的是，增透涂层的激光诱导损伤阈值（约46.9 J/cm²）优于熔融石英基板（约41.1 J/cm²）。本研究提出的方法简便易行且成本效益突出，对推动高性能激光涂层的发展具有广阔应用前景。

搜集汇总

背景与挑战

背景概述

该数据集聚焦于利用纳米多孔SiO2材料开发抗紫外激光的高反射和减反射光学涂层。通过等离子体离子辅助电子束共蒸发和选择性化学蚀刻技术，成功制备了全硅涂层，在355纳米波长下展现出卓越的抗激光性能，其中减反射涂层的损伤阈值甚至超过基底材料，且方法具有简单、经济和大规模生产的潜力。