Advanced nanoporous SiO2 coatings for ultraviolet laser-resistant high-reflection and anti-reflection optics

Laser-resistant coatings are becoming increasingly essential to meet the growing demand for high-power lasers. Enhancing the laser resistance of coating materials represents an effective strategy. By constructing both high-refractive-index (n) and low-n layers of dielectric coatings from SiO2 materials with a large band gap and low absorption loss—specifically, dense SiO2 and porous SiO2 layers—the laser-induced damage threshold (LIDT) of the coatings can be significantly improved. In this study, we demonstrate the fabrication of all-silica laser-resistant anti-reflection (AR) and high-reflection (HR) coatings using a combination of plasma ion-assisted electron-beam co-evaporation of an Al2O3-SiO2 mixture and a subsequent selective chemical etching process. Experiments proved the suitability of this method for producing large-scale multilayer coatings. The porous SiO2 layer exhibited absorption comparable to that of the fused silica substrate. Both AR and HR coatings showed outstanding laser resistance at 355 nm. Notably, the LIDT of the AR coating (~46.9 J/cm2) surpassed that of the fused silica substrate (~41.1 J/cm2). The proposed method is simple and cost-effective, holding great promise for advancing the development of high-performance laser coating.

搜集汇总

背景与挑战

背景概述

该数据集聚焦于利用纳米多孔SiO2材料开发抗紫外激光的高反射和减反射光学涂层。通过等离子体离子辅助电子束共蒸发和选择性化学蚀刻技术，成功制备了全硅涂层，在355纳米波长下展现出卓越的抗激光性能，其中减反射涂层的损伤阈值甚至超过基底材料，且方法具有简单、经济和大规模生产的潜力。