Monitorization of chromium sputtering (PVD) process on plastic
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The file collets the evolution of process parameters during the deposition of a chromium coating by magnetron sputtering (PVD) on a polycarbonate substrate. The process was carried out at Tekniker research center. The monitorized process parameters are: time, gas flow, chamber pressure, substrate temperature, power, current and voltage of the evaporator.
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Zenodo创建时间：
2021-09-17
