Vapor phase deposition of polymers in the presence of low vapor pressure liquids

This report outlines studies of the vapor‐phase deposition of polymers in the presence of low‐vapor pressure liquids. It includes background information on the initiated chemical vapor deposition (iCVD) process which is used to deposit the polymers. There is also background information on other organic and inorganic vapor‐phase deposition processes which have been used with liquid substrates. Finally, there is information on the production and use of polymer films and particles, both of which can be fabricated using iCVD in the presence of liquids. The report discusses results demonstrating that the polymer morphology at the liquid‐vapor interface depends on the surface tension interactions of the liquid and polymer, the deposition rate, the viscosity of the liquid, and the deposition time. It also demonstrates the fabrication of polymer films and includes chemical analysis and a novel method for the fabrication of shaped, free‐standing polymer films deposited onto liquid substrates from the vapor‐phase. Studies of polymer particle fabrication on liquid surfaces were conducted including chemical analysis, particle engulfment, particle growth over time, and the effects of liquid viscosity and polymer molecular weight on the particle size.