Modeling data of double facet mirror in EUV lithography illumination system

This dataset contains the data used for modeling the EUV lithography illumination system's double facet mirrors in Lighttools. This dataset consists of two tables, each with 14 pages, and the data on different pages is applicable to different illumination modes; Each page contains 336 * 9 pieces of data, representing the position and direction of facets in Lighttools for the same illumination mode. A row of data represents the position and direction of a facet, columns 1-3 represent the position (X, Y, Z) of each facet in the global coordinate system, columns 4-6 represent the Z-direction vectors (L, M, N) of each facet, and columns 7-9 represent the Y-direction vectors (P, Q, R) of each facet.