Arabidopsis Raw sequence reads. Arabidopsis thaliana

Four-week-old Arabidopsis seedlings were randomly divided into four groups, and the seedlings in each group were subjected to treatment as follows: pretreatment-stressed (pretreated with H2O2 and salt-stressed, HN); unpretreatment-stressed (pretreated with water and salt-stressed, WN); pretreatment-unstressed (pretreated with H2O2 and not salt-stressed, HW); and unpretreatment-unstressed, control (pretreated with water and not salt-stressed, WW). For pretreatment-stressed and pretreatment-unstressed plants, their leaves were sprayed with 20 H2O2 solution four times at 4-hour intervals, while unpretreatment-stressed and unpretreatment-unstressed plants were sprayed with water. Twenty-four hours after foliar spraying, Arabidopsis seedlings from pretreatment-stressed and unpretreatment-stressed were subsequently watered with 150 mM NaCl every day, whereas pretreatment-unstressed and control plants were treated with water. 12h after treatment with 150 mM NaCl, Arabidopsis seedlings were collected for transcriptome profiling analysis. Our goal is to investigate whether H2O2 pretreatment can enhance plant salt tolerance.