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XRD patterns of vanadium oxide nanostructures on silicon substrate obtained by V2O5 recrystallization

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Mendeley Data2024-01-31 更新2024-06-28 收录
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The DataSet contains the XRD patterns of vanadium oxide nanostructures on silicon substrates obtained by recrystallization of V2O5 thin films between 800-1200°C under synthetic air. The thin films were obtained by the sol-gel method. The information about sol synthesis is described in the Journal of Nanomaterials. X-ray diffraction patterns (XRD) were collected on a Philips X’PERT PLUS diffractometer with Cu Ka radiation (1.5406 Å) and ranging from 10 to 80 degrees.
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2024-01-31
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