Data for Lloyd’s mirror interference lithography with the EUV radiation from a high harmonic source

We demonstrate interference lithography using a high-harmonic source. Extreme ultraviolet (EUV) radiation is produced using high harmonic generation with 800 nm light from a femtosecond Ti:Sapphire laser (40 fs pulses, 1 kHz, 2W average power) in argon gas. Interference patterns created using a Lloyd’s mirror setup and monochromatized radiation at the 27th harmonic (29 nm) are recorded using ZEP-520A photoresist, producing features with < 200 nm pitch. The influence of the use of femtosecond pulsed EUV radiation on the recorded pattern is investigated. The capability of the high-harmonic source for high-resolution patterning is discussed.