Data for the article entitled: "Photocatalytic Coatings Based on TiOx for Application on Flexible Glass for Photovoltaic Panels"

Files include the data presented in the manuscript entitled: "Photocatalytic Coatings Based on TiOx for Application on Flexible Glass for Photovoltaic Panels" by Wiatrowski A. et al. (https://doi.org/10.1007/s11665-022-06655-1)Fig. 1 presents GIXRD patterns of thin TiOx film deposited on SiO2 substrates by gas impulse magnetron sputtering with different oxygen contents in injected Ar/O2 gas mixture: 5%, 6%, 7%, 8%Fig. 4a presents transmission characteristics of non-stoichiometric TiOx thin films deposited on SiO2 substrates by gas impulse magnetron sputtering.Fig. 5a presents Tauc plot for non-stoichiometric TiOx thin films deposited on SiO2 substrates by gas impulse magnetron sputtering.Fig. 6a presents absorption characteristics of non-stoichiometric TiOx thin films deposited on SiO2 substrates by gas impulse magnetron sputtering.Fig. 7a presents refractive index characteristics of non-stoichiometric TiOx thin films deposited on SiO2 substrates by gas impulse magnetron sputtering.Fig. 7b presents extinction coefficient characteristics of non-stoichiometric TiOx thin films deposited on SiO2 substrates by gas impulse magnetron sputtering.Fig. 8 presents influence of oxygen content in Ar/O2 gas mixture during deposition of TiOx thin films on their sheet resistance and resistivity.Fig. 9 presents influence of oxygen content in Ar/O2 gas mixture during deposition of TiOx thin films on their photocatalytic activity.