Dataset in support of the journal article 'Low-temperature vanadium dioxide for CMOS integration and flexible polyimide applications'

Article published in Optical Materials Express

Figure 1:
Figure 1a: no associated data.
Figure 1b: no associated data.
Figure 1c: no associated data.
Figure 1d: no associated data.
Figure 1e: no associated data.
Figure 1f: no associated data.

Figure 2:Sheet Fig.2 Raman shift vs different anneal temperature.

Figure 3:
Figure 3a: Sheet Fig.3(a) XPS data of unannealed sample.
Figure 3b: Sheet Fig.3(b) XPS data of 250 °C annealed sample.
Figure 3c: Sheet Fig.3(c) XPS data of 300 °C annealed sample.
Figure 3d: Sheet Fig.3(d) XPS data of 350 °C annealed sample.
Figure 3e: Sheet Fig.3(e) XPS data of 400 °C annealed sample.

Figure 4:
Figure 4a: Sheet Fig.4(a) FTIR reflectance spectra at different temperatures (250C anneal temperature).
Figure 4b: Sheet Fig.4(b) FTIR reflectance spectra at different temperatures (300C anneal temperature).
Figure 4c: Sheet Fig.4(c) FTIR reflectance spectra at different temperatures (350C anneal temperature).
Figure 4d: Sheet Fig.4(d) FTIR reflectance spectra at different temperatures (400C anneal temperature).
Figure 4e: Sheet Fig.4(e) IR emissivity hysteresis for anneals at 300 °C
Figure 4f: Sheet Fig.4(f) IR emissivity hysteresis for anneals at 350 °C

Figure 5:
Figure 5a: no associated data.
Figure 5b: Sheet Fig.5(b) Raman shift of Kapton comparing with VO2 and V2O5 reference samples.
Figure 5c: Sheet Fig.5(c) FTIR reflectance spectra on Kapton (300C anneal temperature).
Figure 5d: Sheet Fig.5(d) IR emissivity hysteresis for Kapton anneals at 300C.

Supporting Information
Figure S1: no associated data.
Figure S2: Sheet Fig.S2, COMSOL simulated FTIR reflectance spectra under different SiO2 thickness.