Initial oxidation mechanism of FeCrAl thin films with Nb and Si additions
收藏中国科学院兰州化学物理研究所科学数据中心2025-12-11 更新2026-01-10 收录
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资源简介：
FeCrAl thin films are considered optimal candidates for protecting surfaces in harsh environments, with potential for improvement in their anti-oxidation properties by incorporating beneficial dopants such as Nb and Si. However, the thermodynamic mechanism responsible for this improvement remains unknown. This contributes to improvements in the thin films' anti-oxidation properties. Overall, this research sheds light on the origin of the improved oxidation resistance of FeCrAl thin films containing Nb and Si.
提供机构：
中国科学院兰州化学物理研究所科学数据中心
创建时间：
2025-12-11
