Design and simulation in plasmonic interference lithography based on the second-order diffracted wave of grating and hyperbolic multilayer graphene

A plasmonic interference lithography based on the second-order diffracted wave of grating and hyperbolic multilayer graphene is proposed. Simulation results show that structures with air gaps can obtain interference patterns with a half-pitch resolution of 1/8 of the grating period.（Revision: The cover is the Schematic of SPP interference structure ）The contents of documents:Fig. 1. Schematic of SPP interference structure.Fig. 2. Electric field intensity distribution in the lithography structure.Fig. 3. The normalized Eelectric field intensities at 3 positions in the PR layer, and contrast between the two lithography structures.Fig. 4. Test of grating groove width.(without bottom SiO2)Fig. 5. Test of grating groove width.(with bottom SiO2)Fig. 6. Test of SiO2 thickness.Fig. 7. Test of air gap thicknesses.efield2.txt is the simulation result data of electric field intensity distribution in the lithography structure.(unit: V/m, row label as y-direction coordinate (unit: nm), column label as z-direction coordinate (unit: nm))