XRD patterns of VO2 and V6O13 nanostructures
收藏Mendeley Data2024-01-31 更新2024-06-28 收录
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The DataSet contains the XRD patterns of VO2 and V6O13 thin films deposited on a silicon substrate. The as-prepared thin films were annealing under a reducing atmosphere (94% Ar, 6% H2) at 500, 600 and 700C for 10h. X-ray diffraction patterns (XRD) were collected on a Philips X’PERT PLUS diffractometer with Cu Ka radiation (1.5406 Å) and ranging from 10 to 80 degrees. The information about the preparation of as-prepared thin film is described in the Journal of Nanomaterials.
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2024-01-31
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