XRD patterns of V2O5 thin films deposited on silicon substrate

The DataSet contains the XRD patterns of V2O5 thin films deposited on a silicon substrate. The as-prepared thin films were annealing under an oxidizing atmosphere in the temperature range of 300-600C. The results show that the structure of the films dependent on the annealing temperature. X-ray diffraction patterns (XRD) were collected on a Philips X’PERT PLUS diffractometer with Cu Ka radiation (1.5406 Å) and ranging from 10 to 80 degrees. These results are part of a project defined in the Journal of Nanomaterials. In this paper, the information about samples and synthesis details are reported.