Data for The Rect-SRAF Method ILT

This is the data of the paper titled "The Rect-SRAF Method in Inverse Lithography Technology".The source graphic and anchor pattern are saved in file "SourceAndAnchor.mat".The test results for each type of pattern are saved separately in a Matlab file.The Target is the target pattern. The CTM is the continuous transmission mask (CTM). The x/y_CTM, x/y_mask and x/y_image are the coordinates of CTM, mask and aerial image, respectively. The OutputMask_rect and OutputMask_curve are the output masks of the method with rectangular SRAFs and the method with curved SRAFs. The parameters marked with "Manhattan" are the results of the corresponding output mask with Manhattan transformed.

本数据集源自题为《逆向光刻技术中的Rect-SRAF方法》的学术论文。源图形与锚定图案存储于文件"SourceAndAnchor.mat"中。各类图案的测试结果均单独保存于Matlab格式文件内。Target（目标图案）为目标图形。CTM即连续透射掩模（Continuous Transmission Mask）。x/y_CTM、x/y_mask及x/y_image分别对应CTM、掩模以及光刻空中像的坐标。OutputMask_rect与OutputMask_curve分别为采用矩形SRAF的方法与采用曲线SRAF的方法所得到的输出掩模。标记为"Manhattan"的参数为经曼哈顿变换后的对应输出掩模的计算结果。

搜集汇总

背景与挑战

背景概述

该数据集包含用于逆光刻技术中Rect-SRAF方法研究的MATLAB格式数据文件，涵盖了源图形、锚点图案、连续传输掩模(CTM)及不同方法的输出掩模结果。数据集支持计算光刻和逆光刻技术的研究，适用于纳米制造领域。