Interphase formation of ethylenic polymers on photoreactive benzophenone-type adhesion promoters

The presented data supports the publication "Interphase formation of ethylenic polymers on photoreactive benzo-phenone-type adhesion promoters" and covers XPS data of polystyrene immobilized on silicon wafer surfaces modified by photoreactive adhesion promoters using UV light (365 nm LED).

220125 xps data table 1: This file contains XPS spectra on thick droplets of the adhesion promoters after synthesis to characterize their elemental stoichiometry and check the quality of the materials

230725 XPS data table S1: This file contains XPS data of silicon wafers after modified with adhesion promoter PS-K after immobilization of polystyrene (290 kDa Mp) using increasing irradiation doses of UV light (2-1800 s).

250704 XPS data table S2: This file contains XPS data of licon wafers after modified with adhesion promoter triPS-F after immobilization of polystyrene of increasing molecular weight (3.3-5150 kDa Mp) at a single (maximum) UV irradiation dose corresponding to 1800 s. The file also contains data on 2 other immobilized polymer films using the same conditions but PMMA and poly alpha-methylstyrene (PaMS).

The data is provided in form of Vamas-files, which can be read by any XPS data analysis program.