Rate coefficients for the gas‐phase reaction of OH radicals with the L4, L5, D5, and D6 permethylsiloxanes International Journal of Chemical Kinetics

Rate coefficients, k(T), for the gas‐phase OH radical reaction with decamethyltetrasiloxane ((CH3)3SiO[Si(CH3)2O]2Si(CH3)3, L4, k1), dodecamethylpentasiloxane ((CH3)3SiO[Si(CH3)2O]3Si(CH3)3, L5, k2), and decamethylcyclopentasiloxane ([–Si(CH3)2O–]5, D5, k3), and dodecamethylcyclohexasiloxane ([–Si(CH3)2O–]6, D6, k4) were measured using a pulsed laser photolysis—laser induced fluorescence absolute method over the temperature range 270–370 K.