Supplementary information

Details of the fabrication and release process of PMMA mask the and the device fabrication process; optical images with low magnification of release process of PMMA mask; optical photograph of a topological insulator BiSbTeSe2 device fabricated by organic mask technique on substrate adsorbed of large particles; transferred organic mask with large size and high-resolution pattern; transport of EBL-prepared ZrSiSe device; the R curves versus B prior to background subtraction at different temperatures; the measurement and analysis of contact resistance for the devices fabricated by EBL and the organic mask technique; video of the PMMA mask being dry transferred to the silicon substrate; video of the edge of the PMMA mask being torn before it is completely dry transferred to the silicon substrate; video of the PMMA mask being dry transferred to silicon substrate with large mesoscopic particles attached.