Dataset for "In Situ Process Control during Wet-Chemical Etching of Heteroepitaxial III-V Layers using Reflection Anisotropy Spectroscopy"

Experimental raw data for the article "In Situ Process Control during Wet-Chemical Etching of Heteroepitaxial III-V Layers using Reflection Anisotropy Spectroscopy", published in Journal of Physical Chemistry A (2026). DOI: 10.1021/acs.jpca.6c02573. The data set is organised along the figures of the publication. The '.ers' and '.ert' files are reflection anisotropy spectra and and transients, respectively, in the native format of Laytec's EpiRAS. The '.xy' and '.csv' files are XPS data in the export format of SpecsLab Prodigy or reformatted. The '.spm' files are AFM data in the export format of Nanoscope III.