超高水汽阻隔膜的薄膜厚度对阻隔膜性能影响数据集

本数据集针对超高水汽阻隔膜的开发，在低温 80℃的沉积条件下，采用等离子体增强原子层沉积（PEALD）技术在柔性聚对苯二甲酸乙二醇酯（PET）基底上制备氧化铝（Al2O3）阻隔薄膜。通过X射线光电子能谱、椭圆偏振仪测试分析表明，制备的Al2O3薄膜纯度较高，均匀性好。同时，通过调节沉积循环周期制备了不同厚度的Al2O3薄膜，研究了薄膜厚度对其性能的影响。

This dataset is tailored for the development of ultra-high water vapor barrier films. Aluminum oxide (Al₂O₃) barrier thin films were deposited on flexible polyethylene terephthalate (PET) substrates via plasma-enhanced atomic layer deposition (PEALD) at a low temperature of 80℃. Characterizations using X-ray photoelectron spectroscopy (XPS) and ellipsometry demonstrate that the as-deposited Al₂O₃ thin films exhibit high purity and good uniformity. Additionally, Al₂O₃ thin films with different thicknesses were prepared by adjusting the deposition cycle periods, and the effect of film thickness on their performance was investigated.

搜集汇总

背景与挑战

背景概述

该数据集研究了超高水汽阻隔膜的性能，具体通过等离子体增强原子层沉积技术在柔性PET基底上制备不同厚度的氧化铝薄膜，并分析薄膜厚度对性能的影响。数据集包含薄膜制备、纯度、均匀性等测试数据，旨在为柔性铜铟镓硒薄膜太阳能电池的阻隔膜开发提供支持。