Replication Data for: Photocorrosion of n- and p-Type Semiconducting Oxide Covered Metals: Case Studies of Anodized Titanium and Copper

Titanium with 10s of nm thick n-type anatase oxide films and copper with p-type cuprite oxide films have been prepared, and the photoelectrochemical contributions to the corrosion currents analysed and compared. Titanium samples were analysed in 0.5 M sulfuric acid, and copper samples in borate buffer (pH 9). This dataset contains different measurements supporting mechanisms of photodissolution of oxide-covered metals. Most experiments were performed with white light illumination for copper and 320 nm illumination for titanium, but for reference, other wavelengths were also used, and reference measurements in the dark were conducted. The dataset contains the following experimental results: (i) Photovoltage and photocurrent measurements; (ii) potentiodynamic polarisation curves, including measurements with illumination at selected wavelengths throughout the UV-VIS spectrum, measurements with different oxygen or nitrogen purging, and experiments with different illumination intensities; (iii) full electrochemical impedance spectra, including potential dependent measurements; (iv) capacitance measurements at selected frequencies for Mott-Schottky analysis; (v) in situ UV-VIS reflectance spectra of copper after different exposure times to electrolyte with and without illumination; and (vi) downstream ICP-MS analysis of dissolved titanium with and without illumination. All electrochemical experiments were performed under controlled convection, which enabled a quantification of different contributions to the overall uniform photocorrosion rate of copper and titanium. The dataset contains ASCII files with descriptive filenames and is structured in subfolders indicating the respective methods. A detailed interpretation of the results, and the experimental details associated with the dataset is available in the associated article.

本研究制备了厚度为数十纳米的n型锐钛矿氧化物薄膜的钛以及具有p型辉铜矿氧化物薄膜的铜，对其在腐蚀电流中的光电化学贡献进行了分析与比较。钛样品在0.5 M硫酸中进行分析，而铜样品则在硼酸盐缓冲液（pH 9）中进行。本数据集包含了支持覆盖氧化物金属光解机制的不同测量数据。大多数实验采用白光照射铜，以及320 nm照射钛进行，但为参照，也使用了其他波长的光源，并进行了黑暗条件下的参考测量。数据集包含了以下实验结果：(i) 光电压和光电流测量；(ii) 包括在UV-VIS光谱选定的波长下进行光照、不同氧气或氮气吹扫以及不同光照强度下的动电位极化曲线；(iii) 包含电位依赖性测量的全电化学阻抗谱；(iv) 用于Mott-Schottky分析的选定频率下的电容测量；(v) 铜在不同电解质暴露时间下，在有和无光照条件下的原位UV-VIS反射光谱；(vi) 有和无光照条件下的溶解钛的下游ICP-MS分析。所有电化学实验均在受控对流条件下进行，这有助于量化铜和钛的整体均匀光电腐蚀速率的不同贡献。数据集包含具有描述性文件名的ASCII文件，并按相应方法组织在子文件夹中。详细的结果解释以及与数据集相关的实验细节可在相关文章中找到。