Self-Aligned Patterning of Tantalum Oxide on Cu/SiO2 through Redox-coupled Inherently Selective Atomic Layer Deposition
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https://springernature.figshare.com/articles/dataset/Self-Aligned_Patterning_of_Tantalum_Oxide_on_Cu_SiO2_through_Redox-coupled_Inherently_Selective_Atomic_Layer_Deposition/22815749
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资源简介：
Source data for Self-Aligned Patterning of Tantalum Oxide on Cu/SiO2 through Redox-coupled Inherently Selective Atomic Layer Deposition
提供机构：
Wen, Yanwei; Qi, Zilian; Yan, Jin; Zhang, Jingming; Long, Junzhou; Lan, Yuxiao; Shan, Bin; Gu, Eryan; Chen, Rong; Cao, Kun; Li, Yicheng
创建时间：
2023-07-27
