Rare-earth ALD/MLD Processes for R–Organic Hybrid Thin Films

This comparison synthesizes reported ALD/MLD processes for rare-earth–organic hybrid thin films, as summarized in Table 4 of the review. It links the material system to the rare-earth metal precursor (e.g., R(thd)₃, R(dpdmg)₃), the organic precursor (e.g., TPA, 2,6NDA, PDC, Cytosine), growth per cycle (GPC), deposition temperature range, and references. By structuring this information in ORKG, the comparison enables machine-actionable analysis of growth behavior across ligand classes and host systems, allowing queries such as “Which precursor combinations achieve GPC ≥ 5 Å?” or “What temperature ranges are required for Eu-based versus Tb-based hybrids?”.