In-situ annealing of thin films
收藏ESRF Portal2028-01-01 更新2026-04-23 收录
下载链接：
https://doi.esrf.fr/10.15151/ESRF-ES-2044455482
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资源简介：
The goal of this proposal is to measure how thin films crystallize epitaxially on a monocrystalline substrate as they are annealed. To do so, we will use a furnace designed by Sample Environment and previously used in ID28 with controlled temperature and atmosphere. The range of temperatures studied will be RT-900 deg C with a constant flow of synthetic air. The measurement will be done by GIWAXS with the Pilatus detector.
提供机构：
ESRF, 71 avenue des Martyrs, CS 40220, 38043 Grenoble Cedex 9, France
创建时间：
2028-01-01
