The Chemical Vapor Deposition of Nickel Phosphide or Selenide Thin Films from a Single Precursor
收藏NIAID Data Ecosystem2026-03-06 收录
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Nickel phosphide, nickel selenide thin films and their heterostructure (Ni0.85Se/Ni2P) were deposited from a newly synthesized single source precursor {Ni[iPr2P(S)NP(Se)iPr2]2} just by altering the deposition temperature using CVD.
创建时间：
2016-06-03
