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Effect of annealing on ion-beam-sputtered hafnium oxide thin films properties

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DataCite Commons2025-04-27 更新2025-04-16 收录
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https://www.scidb.cn/detail?dataSetId=b601d49641e54d81b6943e308d9caa04
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资源简介:
This dataset contains information on HfO₂ thin films, which are known for their high laser damage threshold and low absorption properties. The HfO₂ thin films were prepared using dual ion beam sputtering and annealed in the atmosphere at temperatures ranging from 200 to 700°C. The dataset includes systematic characterization of the optical properties, microstructure, film stress, and absorption loss of the HfO₂ thin films at various annealing temperatures.
提供机构:
Science Data Bank
创建时间:
2024-12-30
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