Validation of result of STM probe fabrication

The scanning tunneling microscope [1] is a powerful research tool that allows, among other things, to obtain images with atomic resolution. A serious limitation of the described microscope is its limited applicability relating to conductive and semiconductor materials and the reproducibility of measurements depending on the preparation of the measuring probe. In the case of the discussed technique, the probe preparation process is carried out by the operator, which may lead to low repeatability of the results. The file presents the results of imaging a structure composed of periodically arranged conical structures 3 µm apart. The sample was covered with a layer of sputtered gold to ensure conductivity and then scanned using several probes prepared in the same electrochemical process. There are quite significant differences that indicate the need for careful preparation of measuring elements used in tunnel microscopy.
[1] J. Tersoff, D.R. Hamann, Theory of scanning tunneling microscope, Phys. Rev. B. 31 (1985) 805–813