“Interface free” ultrabroadband antireflection film based on nanorods structure with continuous change of refractive index

1. Schematic diagram of optical AR film with continuous changes in refractive index and theoretical calculation diagram of layered media; 2. 45 ° side view of GLAD device substrate fixture, refractive index of SiO2 thin films deposited diagonally at different deposition angles, and AFM morphology of SiO2 thin film surface at different deposition angles; 3. The effect of different film thicknesses on the residual reflectivity of the film when the refractive index continuously changes; 4. The residual reflection curve of AR film measured at 0 ° incidence angle; 5. RMS roughness and AFM morphology of three thin films; 6. LIDT of three AR thin films; 7. The typical damage morphology of ultrawideband AR film at 1064nm; 8. Typical damage morphology of AR film at 1064 nm; 9. The typical damage morphology of ultrawideband AR film at 532 nm, and the typical damage morphology of AR film at 532 nm; 10. The cross-sectional morphology of three types of films and the shadow effect of GLAD film during deposition process