Dataset for: In situ patterning of hierarchical nanoporous gold structures by in-plane dealloying

We developed an in situ method to generate nanoporous gold structures during dealloying. We fabricated a film stack using direct current sputtering deposition for each layer onto a clean silicon surface. We tested the method both with and without an adhesion layer. For the adhesion layer 5 nm of chromium and 100 nm of gold was first deposited, and then a 90 nm alloy layer and 20 nm chromium top layer. Two experiments tested different alloy compositions: Ag82.5Au17.5 and Ag72Au28. A pattern was etched into the top chromium layer. The sample was then submerged into concentrated nitric acid to initiate dealloying. This dataset reports the dealloying distance over time for gold alloys Au 17.5 and Au 28 both with and without the adhesion layer. Surface enhanced Raman spectroscopy was used to characterize the plasmonic substrate. This dataset includes the typical Raman signal of benzenethiol. This dataset is associated with the paper Zhao, F., Zeng, J., Santos, G. M., & Shih, W. C. (2015). In situ patterning of hierarchical nanoporous gold structures by in-plane dealloying. Materials Science and Engineering: B, 194, 34–40. doi:10.1016/j.mseb.2014.12.016.