Experimental Dataset for: Microwave plasma modelling for thick diamond deposition on III-nitrides

***Please see readme and below for version changes. Current Version 2.0***
This dataset contains experimental measurements and growth data for samples produced in the above paper using the two sample holders in a microwave plasma chemical vapour deposition (MP-CVD) reactor. Within this dataset, the following information is provided:
Raman spectroscopy spectra of flipped III-N on Si samples before and after diamond depositionMicroscope images of flipped III-N on Si samples before and after diamond depositionOptical emission spectra (OES) of microwave plasma using different holders and recipes with different microwave power density (MWPD).
- Low MWPD defined as below 3.5 kW 67 mbar
- Medium MWPD defined as 4 kW 93 mbar
-High MWPD defined as above 5 kW 147 mbarPhotos of samples during plasma operation from the top window of the MP-CVD reactor.For additional details not found here, please see the following paper:
https://doi.org/10.1016/j.carbon.2025.120349

Version Change History:
07/05/25 -> Raman duplicate data amended, additional information provided on photo filenames