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Reaction between <sup><i>t</i></sup>BuMgCl and SnCl<sub>4</sub>, Illustrating the Solvent-Dependent Predominant Formation of Cl(<sup><i>t</i></sup>Bu<sub>2</sub>Sn)<sub><i>n</i></sub>Cl (THF, <i>n</i> = 1; Toluene, <i>n</i> = 2; Hexane, <i>n</i> = 3) and the Subsequent Wavelength-Selective Photoche

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The addition of THF solutions of tBuMgCl to SnCl4 in varying solvents (S) results in a dramatic change of the predominant product obtained Cl(tBu2Sn)nCl (n = 1–3). For S = THF the product obtained was tBu2SnCl2, S = toluene, benzene yields Cl(tBu2Sn)2Cl, while for S = hexane the tristannane Cl(tBu2Sn)3Cl was isolated in 45% yield. The last compound is photochemically sensitive when irradiated at 350 nm to form Cl(tBu2Sn)2Cl. Irradiation of this latter material with a 254 nm lamp results in the formation of tBu2SnCl2.

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2011-09-12
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