Data related to paper "In-situ analysis of metal atom, metal ion and argon ion fluxes in industrial magnetron sputtering with Al, Cr and AlCr targets"

The presented study focuses on the quantitative measurement of atomic and ionic particle fluxes during magnetron sputtering deposition, including the differentiation of metal species (Al, Cr) and the determination of ion-to-neutral ratios at the substrate position. This work directly contributes to understanding and controlling the ion flux, ion energy and composition of species arriving at the substrate—parameters that are essential for the preparation, modification and doping of ferroic and multiferroic thin‑film structures. The ability to quantify metal and argon ion fluxes, including their relative contributions, is crucial for predicting defect formation, tailoring film growth mechanisms and optimizing ion‑assisted deposition or implantation processes. These insights support the development of controlled ion irradiation and doping strategies, which are key technological steps within the FErrmion project. The methodology demonstrated in the study provides a foundation for designing experiments where ion flux, ion species and deposition conditions must be precisely tuned to achieve targeted structural or functional modifications in ferroic materials. This study provides a quantitative analysis of atomic and ionic fluxes during magnetron sputtering, including the differentiation of metal species and the determination of ion‑to‑neutral ratios at the substrate. These results are directly relevant to Activity 4A3, which focuses on the preparation and deposition of new ferroic structures prior to doping or implantation. The ability to measure and control the flux, composition and ionisation fraction of species arriving at the substrate is essential for tailoring thin‑film growth, defect formation and the initial structural conditions of materials intended for subsequent implantation. The methodology demonstrated in the paper—combining quartz crystal microbalance measurements, Langmuir probe diagnostics and RBS analysis—provides critical input parameters for designing deposition processes that enable controlled modification of ferroic materials. This aligns precisely with the objectives of Activity 4A3, where optimised deposition conditions form the technological foundation for later doping, irradiation or defect‑engineering steps within the FErrmion project.