Transcriptional Response of Multi-stress Tolerant Saccharomyces cerevisiae to Sequential Stress

To better understand how yeast adapt and respond to sequential stressors, an industrial yeast strain, URM 6670 (also known as BT0510), which is highly flocculent, tolerant to ethanol, osmotic and heat shock stresses, was subjected to three different treatments: 1. osmotic stress followed by ethanol stress, 2. oxidative stress followed by ethanol stress, 3. glucose withdrawal followed by ethanol stress. Samples were collected before the first stress (control), after the first stress and after the second stress (ethanol). RNA was extracted and analyzed by RNAseq. Overall design: Comparison of the transcriptional responses, relative to untreated samples, of yeast strain BT0510 subjected to oxidative stress, osmotic stress and glucose deprivation stress, followed in all cases by ethonal exposure