R74 - Simon Scherrer
收藏DataCite Commons2025-01-30 更新2025-04-09 收录
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Rough surface with CrN deposited on the backside of a single-side-polished silicon wafer, which has been subsequently etched with isotropic reactive ion etching. The sample is UV/ozone (Ossila UV Ozone Cleaner) cleaned for 10 min. AFM scans (tapping mode in air) are performed on a Bruker Icon Dimension with a fresh Olympus OMCL-AC160TS cantilever (fres = 300 kHz, kz = 26 N/m, tip radius = 7 nm). Scan sizes range from 1-30 μm in order to resolve the features of the sample.
Author: Simon Scherrer
提供机构：
contact.engineering
创建时间：
2025-01-30
