Characterization of fabrication process of micropores on silicon substrate by electrochemical method

ABSTRACT In the present work, the fabrication process of a set of micropores on crystalline silicon wafers manufactured through wet etching technique was studied. The influence of different control factors such as voltage, temperature and braking agent on the specific characteristics of formation was evaluated. An exhaustive analysis of the evolution of electric currents during the fabrication made possible to standardize the process and determine the pore-formation time, essential feature considering the exigent requirements of industry. Finally, it was concluded that optimum conditions for a controlled fabrication of pores correspond to a temperature of 84 ˚C, HCl as a braking agent and voltages of 0,1V, 0,5V and 1V respectively. The above results are of great importance in different fields, such as biology or medicine, in relation to the utility of pores as sensing devices.