Data underlying the publication: Area-selective Atomic Layer Deposition through Selective Passivation of SiO2 with a SF6/H2 Plasma
收藏DataCite Commons2025-07-02 更新2025-07-19 收录
下载链接：
https://data.4tu.nl/datasets/e96c7616-f34a-4e39-a3ea-e78db832f8b4
下载链接
链接失效反馈官方服务：
资源简介：
Dataset to accompany the publication of a manuscript on Area-selective Atomic Layer Deposition through Selective Passivation of SiO<sub>2</sub> with a SF<sub>6</sub>/H<sub>2</sub> Plasma. The data contains ellipsometry data of the substrates during plasma exposures and nucleation curves of TiO<sub>2</sub> deposition on HfO<sub>2</sub>, ZnO, Al<sub>2</sub>O<sub>3</sub> and SiO<sub>2</sub>; Reflection absorption infrared spectra on SiO<sub>2</sub> and Al<sub>2</sub>O<sub>3 </sub>for different plasma and reactant exposures; and x-ray photoelectron spectra of SiO<sub>2</sub> after plasma exposure. Further details can be found in README.txt and the manuscript.<br>
提供机构：
4TU.ResearchData
创建时间：
2025-07-02
