NIST Nanocalorimeter DWG and DXF drawings for microfabrication mask generation

Four files are included in this data set for mask generation that can be used to produce photolithography contact masks to create NIST nanocalorimeters. Two different designs are included, each in AutoCAD *.dwg format and a universal *.dxf format. The masks are intended to be printed on 5 inch masks blanks used to pattern 100 mm (4 inch) wafers. The front drawings are used to pattern the metal layer that defines the contact pads and the combined heater / thermometer and includes alignment marks at the center of the mask and at approximately plus and minus 1 inch along the X-axis for front to back alignment. The rear drawings have already been mirrored and define the KOH etch windows used to create individual die and create the windows in the center of the nanocalorimeter. The dimensions of the windows was defined for a standard, nominal, 525 micron thick 100-mm wafer.
Please cite the related paper "Guide to the Design, Fabrication and Calibration of NIST Nanocalorimeters" by Feng Yi, Michael D. Grapes, and David A. LaVan in the Journal of Research of the National Institute of Standards and Technology, Volume 124 (in press).