Optical properties of tellurium dioxide thin films
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TeO2 and TeO2 doped by Eu thin films manufactured by magnetron sputtering method were measured by optical spectroscopy. Metallic Te target and Te-Eu mosaic target with diameter of 50.8 mm were sputtered for about 45 min in argon-oxygen atmosphere what resulted in 300 nm film thickness deposition. The pressure in the chamber was below 0.2 Pa and substrate was heated at 200 oC. The distance between sputtered targets and the Corning 1737 glass substrate was about 10 cm. Optical transmission characteristics were recorded with Evolution 220 UV-Visible Spectrophotometer in a range of 250 nm –1100 nm. UV-VIS measurements showed high transparency of films. Optical properties, such as optical band gap were calculated on the basis of measurements.
提供机构：
Marcin Stanisław Łapiński
