Data relating to "Combinatorial Sputtering of Photoluminescent Europium Titanium Oxide Thin Films"

Photoluminescent thin films were fabricated using a combinatorial physical vapour deposition (PVD) sputtering process, enabling rapid variation of europium oxide (Eu2O3) in titanium dioxide (TiO2) with concentrations varying from x = 0 to 1 in x = Eu/(Eu+Ti). Figure 1: The relationship of the composition x as a function of L in Eu/(Eu+Ti). Figure 2: The emission spectra of samples with different components. Figure 3: Powder XRD patterns data of samples with different components. Figure SI 9&10&11: Powder XRD pattern data of quartz substrate, and Thin film XRD patterns data of samples with different components. Figure SI 12&13: Raman spectra data of samples with different components. Figure SI 14&15: Excitation and emission spectra of samples with x = 6 at% and 8 at% as-deposition, after annealing at 450˚C and annealing at 600˚C. Figure SI 16: Excitation of 5 at%, 6 at%, 8 at%, 18 at%, 26 at%, 77 at% and 98 at% Eu/(Eu+Ti) samples after annealing at 600˚C. Figure SI 17&18: Transmittance and Bandgap of x = 0 at%, 6 at%, 26 at%, 77 at%, 98 at% and 100 at% thin films.